JPH043699Y2 - - Google Patents
Info
- Publication number
- JPH043699Y2 JPH043699Y2 JP4580087U JP4580087U JPH043699Y2 JP H043699 Y2 JPH043699 Y2 JP H043699Y2 JP 4580087 U JP4580087 U JP 4580087U JP 4580087 U JP4580087 U JP 4580087U JP H043699 Y2 JPH043699 Y2 JP H043699Y2
- Authority
- JP
- Japan
- Prior art keywords
- reel
- wire
- upstream
- downstream
- plastic deformation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000011144 upstream manufacturing Methods 0.000 claims description 30
- 238000005452 bending Methods 0.000 claims description 19
- 238000003466 welding Methods 0.000 claims description 17
- 238000004804 winding Methods 0.000 description 7
- 238000010276 construction Methods 0.000 description 1
Landscapes
- Wire Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4580087U JPH043699Y2 (en]) | 1987-03-30 | 1987-03-30 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4580087U JPH043699Y2 (en]) | 1987-03-30 | 1987-03-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63157443U JPS63157443U (en]) | 1988-10-14 |
JPH043699Y2 true JPH043699Y2 (en]) | 1992-02-05 |
Family
ID=30864867
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4580087U Expired JPH043699Y2 (en]) | 1987-03-30 | 1987-03-30 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH043699Y2 (en]) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6274292B1 (en) | 1998-02-25 | 2001-08-14 | Micron Technology, Inc. | Semiconductor processing methods |
US6268282B1 (en) | 1998-09-03 | 2001-07-31 | Micron Technology, Inc. | Semiconductor processing methods of forming and utilizing antireflective material layers, and methods of forming transistor gate stacks |
US6281100B1 (en) | 1998-09-03 | 2001-08-28 | Micron Technology, Inc. | Semiconductor processing methods |
US6828683B2 (en) | 1998-12-23 | 2004-12-07 | Micron Technology, Inc. | Semiconductor devices, and semiconductor processing methods |
US7067414B1 (en) | 1999-09-01 | 2006-06-27 | Micron Technology, Inc. | Low k interlevel dielectric layer fabrication methods |
US6440860B1 (en) | 2000-01-18 | 2002-08-27 | Micron Technology, Inc. | Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride |
-
1987
- 1987-03-30 JP JP4580087U patent/JPH043699Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS63157443U (en]) | 1988-10-14 |
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